CSU-Carig
Apparel design through patternmaking / Injoo Kim, Myoungok Kim, Zachary Hoh, University of Cincinnati, Cincinnati, Ohio.
by Kim, Injoo, author.
Published by : Fairchild Books, (New York :) Physical details: xxxiv, 743 pages : illustrations ; 29 cm. ISBN: 9781501360237. Year: 2022| Item type | Location | Collection | Call number | Status | Date due | Barcode |
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Books
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General Collection | Applied Sciences | 646.4 K492 2022 (Browse shelf) | Available | 010621 |
Browsing Cagayan State University - Carig Library Shelves , Shelving location: General Collection , Collection code: Applied Sciences Close shelf browser
| 643.7 B7687 1987 The home repair book / | 646.2 W6856 2000 The complete idiot’s guide to sewing / | 646.2044 Se517 1989 Sewing with an overlock. | 646.4 K492 2022 Apparel design through patternmaking / Injoo Kim, Myoungok Kim, Zachary Hoh, University of Cincinnati, Cincinnati, Ohio. | 646.4 M3199a 1989 Advance procedure in dressmaking / Manzarate, Freddie Nocum. | 646.4 M3199 1989 Step-by-step basic and advance procedure in tailoring / Manzarate, Freddie Nocum.,author. | 646.4 T5313 2014 Apparel construction / by 3G Elearning LLC. |
Includes bibliographical references and index.
"Apparel Design Through Patternmaking is a fresh design-oriented text that gives fashion students a new perspective on patternmaking knowledge and skills they need to develop contemporary women's, men's, and children's wear. The authors cover a comprehensive range of concepts in flat pattern drafting, such as fit, style, and design development, and their modular approach allows for flexible design options across age, gender, and size, as reflected in current fashion trends. 130 detailed principles address proper measurements; body shapes; dart manipulation; neckline, collar, and sleeve variations; fit issues and corrections; garment details; and more, all of which are easily visualized with hundreds of line drawings and photos. Reference size charts and a decimal conversion chart included in the Appendix make this text user-friendly for international students"--
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